| Dry Etching of Chrome for Photomasks for 100nm Technology using Chemically Amplified Resist, April 2002 (137KB) |
| Raster Scan Patterning Solution for 100nm and 70nm OPC Masks, April 2002 (220KB) |
| The Process of Manufacturing and Inspection of High-end (Ternary) Tritone EAPSM Reticles for 0.13 µm Design Rule Generation, April 2002 (228KB) |
| In-situ Optical Emission Spectroscopic Examination of Chrome Etch for Photomasks, April 2002 (450KB) |
| DUV Laser Scanning for Mask Pattern Generation at the 130 and 100 Nanometer Nodes, March 2002 (59KB) |
| Evaluation of OPC Mask Printing with a Raster Scan Pattern Generator, March 2002 (242KB) |
| REAP (Raster E-Beam Advanced Process) Using 50kV Raster E-beam System for Sub-100nm Node Mask Technology, March 2002 (204KB) |
| Inspection of Alternating PSM Reticles Using UV-based 365nm Reticle Inspection Tool, January 2002 (605KB) |
| Mask CD Uniformity Impact During Incoming Quality Control, January 2002 (187KB) |
| Chemically Amplified Resist Approaches for E-beam Lithography Mask Fabrication, December 2001 (504KB) |
| An Endpoint Solution for Photomask Chrome Loads Down to 0.25%, October 2001 (193KB) |
| Chrome Etch for <0.13µm Advanced Reticle Production, October 2001 (74KB) |
| Extended Chamber Matching and Repeatability Study for Chrome Etch, October 2001 (354KB) |
| 100nm OPC Mask Patterning using Raster-Scan, 50kV Pattern Generation Technology, October 2001 (1.3MB) |
| Process Optimization for Particle Removal on Blank Chrome Mask Plates in Preparation for Resist Application, October 2001 (98KB) |
| Implementation and Characterization of a DUV Raster-scanned Mask Pattern Generation System, October 2001 (1.3MB) |
| Characterization of an Integrated Multibeam Laser Mask-Pattern Generation and Dry-Etch Processing Total Solution, October 2001 (223KB) |
| Inspection of EAPSMs Mask for 193nm Technology Generation using a UV-based 365nm Reticle Inspection Tool, October 2001 (111KB) |
| Using High-Resolution (0.13µm) UV-based Reticle Inspection for CD Uniformity in Incoming Quality Control, October 2001 (155KB) |
| Inspection of Production Alternating PSM Reticles Using UV-based 365nm Reticle Inspection Tool, October 2001 (496KB) |
| High Productivity Mask Writer with Broad Operating Range, May 2001 (2.8MB) |
| Mask Process Design Optimization Based on Quality Mapping Using Standard Mask Inspection Equipment, April 2001 (150KB) |
| Photoresist Processing for High-resolution DUV Lithography at 257nm, April 2001 (55KB) |
| Demonstration of Multiblanker Electron-beam Technology, December 2000 (264KB) |
| Multiple Electron-beam Lithography, December 2000 (4.8MB) |
| Photomask Patterning and the Influence of Substrate Bulk Heating on Placement Accuracy, December 2000 (164KB) |
| Mask Patterning Solutions for 130nm Wafer Lithography and Below, October 2000 (1.3MB) |
| Lithographic Performance Results for a New 50kV Electron-beam Mask Writer, September 2000 (1.3MB) |
| Comprehensive Simulation of Electron-beam Lithography Processes Using PROLITH/3D and TEMPTATION software tools, September 2000 (878KB) |
| Process Development for 257nm Photomask Fabrication Using Environmentally Stable Chemically Amplified Photoresists, September 2000 (914KB) |
| 130nm Node Mask Development, September 2000 (458KB) |
| Improved Throughput in 0.6 NA Laser Reticle Writers, September 2000 (320KB) |
| Potential of DNQ/Novolac and Chemically Amplified Resists for 100nm Device Generation Maskmaking, September 2000 (110KB) |
| Multisource Optimization of a Column for Electron Lithography, August 2000 (4.3MB) |
| Optimization of Microcolumn Electron Optics for High-current Applications, August 2000 (601KB) |
| Advances in Arrayed Microcolumn Lithography, August 2000 (1.0MB) |
| 1kV Resist Technology for Microcolumn-based Electron-beam Lithography, August 2000 (3.8MB) |
| Implementation of Real-time Proximity Effect Correction in a Raster Shaped Beam Tool, June 2000 (81KB) |
| Elements of an Advanced Pattern Generator for 130-100nm Maskmaking, 4/00 (424KB) |
| Lithography Performance of Contact Holes—Part I. Optimization of Pattern Fidelity Using MPG and MPG-II, April 2000 (215KB) |
| New Technology for Accurate Positioning of Circuitry on Microvia Panels, April 2000 (27KB) |
| The ALTA 3700: Extending the Application Space of the ALTA 3500 Laser Reticle Writer, April 2000 (683KB) |
| Advances in High-Throughput Multiple Electron-beam Lithography, 3/00 (133KB) |
| Evaluation of the High-Dose, Extended Graybeam Writing System for 130nm Pattern Generation, March 2000 (300KB) |
| Initial Benchmarking of a New Electron-beam Raster Pattern Generator for 100-130nm Maskmaking, March 2000 (256KB) |
| Leading-edge Mask Patterning for 130-100nm Devices, March 2000 (120KB) |
| A Predictive and Corrective Model for Bulk Heating Distortion in Photomasks, January 2000 (164KB) |
| Lithographic Analysis of Multipass Gray Writing Strategy for Electron-beam Pattern Generation, December 1999 (324KB) |
| Advanced Mask Patterning Technology for 130-100nm Generation, November 1999 (220KB) |
| Partnering for Mutual Success, November 1999 (10KB) |
| Reduction of Beam-induced Pattern Placement Errors in MEBES Systems, November 1999 (66KB) |
| Extension of Graybeam Writing for the 130nm Technology Node, October 1999 (316KB) |
| Improved Critical Dimension Control in 0.8-NA Laser Reticle Writers, 10/99 (165KB) |
| Improving CDs on a MEBES System by Improving the ZEP 7000 Development and Dry Etch Process, 10/99 (114KB) |
| System Architecture Choices for an Advanced Mask Writer (100-130nm), October 1999 (237KB) |
| Experimental and Numerical Investigations of Photomask Substrate Heating Due to Electron Beam Patterning, 9/99 (112KB) |
| Lithography and CD Performance of Advanced MEBES Mask Pattern Generators, September 1999 (1.5MB) |
| Resist Heating with Different Writing Strategies for High-throughput Maskmaking, September 1999 (2.6MB) |
| Electron-beam Lithography Simulation for Maskmaking, Part IV: Effect of Resist Contrast on Isofocal Dose, July 1999 (292KB) |
| Raster Shaped Beam Pattern Generation, July 1999 (617KB) |
| Design Considerations for an Electron-beam Pattern Generator for the 130nm Generation of Masks, April 1999 (515KB) |
| Advantages of Isofocal Printing in Maskmaking with the ALTA 3500, March 1999 (73KB) |
| Contrast Limitations in Electron-beam Lithography, March 1999 (228KB) |
| Use of a MEBES Tool to Manufacture 180nm Reticles, March 19999 (270KB) |
| Optical Lithography Simulation and Photoresist Optimization for Photomask Fabrication, 1999 (344KB) |
