Applied NeXus SPC performs split-second analysis of process conditions in Applied’s semiconductor processing systems. No other system monitors critical process parameters up to 100 times per second (100Hz), combining data from multiple sensors to create real-time patterns that immediately spotlight and track changing process conditions. NeXus SPC is currently available on several Applied Materials processing systems, including the Applied Vantage Radiance Plus RTP, Applied Vantage RadOx RTP, Applied Centura Epi and Applied Endura PVD systems. NeXus SPC can be integrated with Applied NeXus for more detailed, off-line data analysis and larger data storage.